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− | <h1> | + | <h1>NITRIC OXIDE RELEASE</h1> |
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− | <p>Nitric Oxide release has been a major issue for precise | + | <p>Nitric Oxide (NO) release has been a major issue for precise NO sensor and AND gate testing. NO is a unstable species which degrades quickly in an aqueous medium. It is produced using the DETA/NO release mechanism. DETA was chosen because its half life is about 20 h, meaning it produces a slow and regular release, ensuring an almost constant concentration for a long duration. |
</p> | </p> | ||
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<img src="https://static.igem.org/mediawiki/2016/2/2f/T--ETH_Zurich--NOreleaselowcc.svg"> | <img src="https://static.igem.org/mediawiki/2016/2/2f/T--ETH_Zurich--NOreleaselowcc.svg"> | ||
</a> | </a> | ||
− | <p><b>Figure 1: </b> | + | <p><b>Figure 1: </b>Calibration curve for DETA/NO release for different DETA concentrations ranging from 10 nM to 500 nM.</p> |
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<img src="https://static.igem.org/mediawiki/2016/3/33/T--ETH_Zurich--NOreleasehighcc.svg"> | <img src="https://static.igem.org/mediawiki/2016/3/33/T--ETH_Zurich--NOreleasehighcc.svg"> | ||
</a> | </a> | ||
− | <p><b>Figure 2: </b> | + | <p><b>Figure 2: </b>Calibration curve for DETA/NO release for DETA concentrations ranging from 1 mM to 100 mM.</p> |
</div> | </div> | ||
</div> | </div> |
Revision as of 21:21, 18 October 2016
NITRIC OXIDE RELEASE
Nitric Oxide (NO) release has been a major issue for precise NO sensor and AND gate testing. NO is a unstable species which degrades quickly in an aqueous medium. It is produced using the DETA/NO release mechanism. DETA was chosen because its half life is about 20 h, meaning it produces a slow and regular release, ensuring an almost constant concentration for a long duration.